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Photomask and X-ray mask technology IV 17-18 April, 1997, Kawasaki, Japan by

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Published by SPIE in Bellingham, Washington .
Written in English

Subjects:

  • Masks (Electronics) -- Congresses.,
  • Integrated circuits -- Masks -- Congresses.,
  • X-ray lithography -- Congresses.,
  • Microlithography -- Congresses.

Book details:

Edition Notes

Includes bibliographic references and author index.

Other titlesPhotomask and X-ray mask technology 4, Photomask and X-ray mask technology four
StatementNaoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering.
SeriesProceedings / SPIE--the International Society for Optical Engineering ;, v. 3096, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3096.
ContributionsAizaki, Naoaki., Photomask Japan., BACUS (Technical group), Ōyō Butsuri Gakkai., Society of Photo-optical Instrumentation Engineers. Japan Chapter.
Classifications
LC ClassificationsTK7872.M4 P46 1997
The Physical Object
Paginationxiii, 504 p. :
Number of Pages504
ID Numbers
Open LibraryOL418337M
ISBN 100819425168
LC Control Number98122044
OCLC/WorldCa37589239

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The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet Brand: CRC Press. Get this from a library! Photomask and X-ray mask technology IV: April, , Kawasaki, Japan. [Naoaki Aizaki; Photomask Japan.; BACUS (Technical group); Ōyō.   Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies by: Photomask And Next-generation Lithography Mask Technology XII (2 volume set) by Masanori Komuro (Author) ISBN ISBN Why is ISBN important? ISBN. This bar-code number lets you verify that you're getting exactly the right version or edition of a book.

  As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask . PROCEEDINGS VOLUME Photomask and X-Ray Mask Technology II. Editor(s): Hideo Yoshihara *This item is only available on the SPIE Digital Library. Amorphous stuctured Ta4B absorber on SiC membrane for x-ray mask Author(s). Co-location of the SPIE Photomask Technology Conference with the EUV Lithography Symposium in a single setting presents a unique opportunity for technologists from both the mask and wafer worlds to meet and share results, challenges, and potential solutions throughout the EUV development and manufacturing process. Manufactured in what’s called a mask shop, the photomask is a template or master copy of what will be printed on the final wafer. Generally, an optical mask consists of an opaque layer of chrome on a glass substrate. In the mask production flow, the first step is to obtain the data from a given IC design.

Photomask and X-Ray Mask Technology II 作者: Bacus (Technical Group) / Japan) Photomask Japan 9 ( Kawasaki-Shi 出版社: Society of Photo Optical 副标题: April Kawasaki City, Kanagawa, Japan (Proceedings of Spie--the International Society for Optical Engineering, V. ). Toppan Quality Statement: We will be our customers' first choice for photomasks By providing superior technology, quality assurance, reliability, delivery and value to meet and exceed customer's expectation By focusing on customer needs and assuring customer satisfaction through Advanced Mask Technology Center. Get this from a library! Photomask and X-ray mask technology V: April, , Kawasaki, Japan. [Naoaki Aizaki; Photomask Japan.; BACUS (Technical group); Society of .   A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography. This video is .